AI-LithoFusion

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  EUV Lithography

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  App

The increasing complexity of EUV lithography and the demand for atomic-scale precision in semiconductor manufacturing inspired us to build AI-LithoFusion. Traditional methods for Design of Experiments (DOE) are time-consuming, manually intensive, and prone to variability. We envisioned an AI-integrated platform to automate optimization, reduce turnaround time, and enhance defect prediction accuracy—ushering in a smarter, scalable way to handle advanced lithographic processes.

AI-LithoFusion is a web-based platform that leverages artificial intelligence to:Automate DOE parameter optimization for EUV lithography.Predict defects and overlay errors in photoresist patterns.Analyze simulation and fab data in real time.Provide visual analytics and process tuning suggestions through an intuitive interface.Enable faster iteration cycles for mask and wafer design.

https://bolt.new/ Text Prompt

Creating a domain-specific AI model that understands the physics and constraints of EUV lithography.Simulating realistic photoresist responses without direct access to fab data.

How to bridge the gap between AI and semiconductor domain knowledge.Building high-performance React applications with TypeScript and advanced charting libraries.

Integration with real fab data pipelines using secure APIs.AI model refinement using transfer learning from commercial EUV datasets (if available).

Collaboration features for teams working across DOE phases.

Built With

• react
• typescript